Microcrystalline and polycrystalline silicon films for solar cells obtained by gas-jet electron-beam PECVD method

IEE Proceedings: Circuits, Devices and Systems

Volumn 150, Issue 4, 2003, Pages 293-299

  Bilyalov, R ^a   Poortmans, J ^a   Sharafutdinov, R ^b   Khmel, S ^b   Schukin, V ^b   Semenova, O ^c   Fedina, L ^c  

^a IMEC   (Belgium)

^b KUTATELADZE INSTITUTE OF THERMOPHYSICS   (Russian Federation)

^c INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SOLAR CELLS;

SILICON FILMS;

THIN FILMS;

EID: 0142219445     PISSN: 13502409     EISSN: None     Source Type: Journal    
DOI: 10.1049/ip-cds:20030665     Document Type: Conference Paper

References (20)

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