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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 1, 2002, Pages 169-175

Structural and optical properties of nanocrystalline silicon films deposited by plasma-enhanced chemical vapor deposition

(4) Ali, Atif Mossad a Inokuma, Takao a Kurata, Yoshihiro a Hasegawa, Seiichi a

a KANAZAWA UNIVERSITY (Japan)

Author keywords

Deposition temperature; Effects of hydrogen and fluorine addition; Nanocrystalline silicon; Photoluminescence; Plasma enhanced CVD; Quantum size effect

Indexed keywords

ENERGY GAP; ETCHING; FREE RADICALS; GRAIN SIZE AND SHAPE; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM THEORY; RAMAN SCATTERING; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; X RAY DIFFRACTION ANALYSIS;

NANOCRYSTALLINE SILICON FILMS;

NANOSTRUCTURED MATERIALS;

EID: 0036304212 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.41.169 Document Type: Article

Times cited : (9)

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