Growth of microcrystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 5, 1998, Pages 3134-3137

  Imaizumi, Mitsuru ^a   Okitsu, Kazuhiko ^a   Yamaguchi, Masafumi ^a   Hara, Tamio ^a   Ito, Tadashi ^b   Konomi, Ichiro ^b   Ban, Masahito ^c   Tokai, Masakuni ^c   Kawamura, Kazuhiko ^d  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b Rd Management Section   (Japan)

^c KAWASAKI HEAVY INDUSTRIES LTD   (Japan)

^d CHUBU ELECTRIC POWER CO INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032377928     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581471     Document Type: Article

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