A new high-rate deposition method for thin film crystalline Si solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2002, Pages 1178-1181

  Sharafutdinov, R ^a   Khme, S ^a   Semenova, O ^b   Svitasheva, S ^b   Bilyalov, R ^c   Poortmans, J ^c  

^a KUTATELADZE INSTITUTE OF THERMOPHYSICS   (Russian Federation)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRON BEAMS; ELLIPSOMETRY; FREE RADICALS; GRAIN SIZE AND SHAPE; MOLECULES; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; STAINLESS STEEL; SUBSTRATES; THIN FILMS;

CRYSTALLINE SILICON FILMS; GAS ELECTRON BEAM PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILM CRYSTALLINE SILICON SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 0036948570     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)

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