Plasma enhanced chemical vapor deposition of silicon oxide films using TMOS/O2 gas and plasma diagnostics

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 125-131

  Bang, S B ^a   Chung, T H ^a   Kim, Y ^a  

^a Dong A University   (South Korea)

Author keywords

Infrared spectroscopy; Langmuir probe; Optical emission spectroscopy; Plasma enhanced chemical vapor deposition; SiO2 deposition; Tetramethoxysilane

Indexed keywords

OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILICON COMPOUNDS;

SILICON OXIDE FILMS;

MULTILAYERS;

EID: 0142055133     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01127-1     Document Type: Article

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