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Vacuum

Volumn 66, Issue 3-4, 2002, Pages 353-357

Gas barrier properties of silicon oxide films prepared by plasma-enhanced CVD using tetramethoxysilane

(4) Teshima, K a,b Inoue, Y a Sugimura, H a Takai, O a

a NAGOYA UNIVERSITY (Japan)

b DAI NIPPON PRINTING CO LTD (Japan)

Author keywords

Gas barrier; Organosilane; Oxygen transmittance; PECVD; Silicon oxide

Indexed keywords

COMPOSITION EFFECTS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IMPURITIES; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES; SILICA; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS BARRIER;

SEMICONDUCTING FILMS;

EID: 0037136151 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/S0042-207X(02)00143-4 Document Type: Article

Times cited : (33)

References (21)

1
- 0002646750
- (1976) Thin Solid Films , vol.33 , pp. 35
- Misonneuve, M.¹ Segui, Y.² Bui, A.³

2
- 0001601849
- (1994) Appl Phys Lett , vol.65 , pp. 3185
- Deshmukh, S.C.¹ Aydil, E.S.²

3
- 0029376534
- (1995) J Vac Sci Technol A , vol.13 , pp. 2355
- Deshmukh, S.C.¹ Aydil, E.S.²

4
- 0032027592
- (1998) Thin Solid Films , vol.316 , pp. 79
- Inoue, Y.¹ Takai, O.²

5
- 0033531819
- (1999) Thin Solid Films , vol.345 , pp. 90
- Inoue, Y.¹ Sugimura, H.² Takai, O.³

6
- 0028518259
- (1994) Thin Solid Films , vol.250 , pp. 206
- Sahli, S.¹ Segui, Y.² Ramdani, S.³ Takkouk, Z.⁴

7
- 0001627862
- (1992) J Appl Phys , vol.72 , pp. 4214
- Li, S.C.¹ Murarka, S.P.²

8
- 21144482510
- (1993) J Vac Sci Technol A , vol.11 , pp. 400
- Tochitani, G.¹ Shimozuma, H.² Tagashira, H.³

9
- 0035874113
- (2001) Thin Solid Films , vol.386 , pp. 252
- Inoue, Y.¹ Sugimura, H.² Takai, O.³

10
- 0035973374
- (2001) Thin Solid Films , vol.390 , pp. 88
- Teshima, K.¹ Inoue, Y.² Sugimura, H.³ Takai, O.⁴

11
- 0345525032
- (1986) J Appl Phys , vol.60 , pp. 3136
- Batey, J.¹ Tierney, E.²

12
- 0023348530
- (1987) Thin Solid Films , vol.149 , pp. 85
- Gokan, H.¹ Morimoto, A.² Murahata, M.³

13
- 0026914571
- (1992) J Electrochem Soc , vol.139 , pp. 2604
- Patrick, W.J.¹ Schwartz, G.C.² Chapple-Sokol, J.D.³ Carruthers, R.⁴ Olsen, K.⁵

14
- 0001213855
- (1992) J Vac Sci Technol B , vol.10 , pp. 1139
- Ray, S.K.¹ Maiti, C.K.² Lahiri, S.K.³ Chakrabarti, N.B.⁴

15
- 21144482510
- (1993) J Vac Sci Technol A , vol.11 , pp. 400
- Tochitani, G.¹ Shimozuma, M.² Tagashira, H.³

16
- 0000257431
- (1993) Appl Phys Lett , vol.62 , pp. 228
- Joubert, O.¹ Burke, R.² Vallier, L.³ Martinet, C.⁴ Devine, R.A.B.⁵

17
- 0000785738
- (1995) J Vac Sci Technol A , vol.13 , pp. 2924
- Alonso, J.C.¹ Ramirez, S.J.² Garcia, M.³ Ortiz, A.⁴

18
- 0031167231
- (1997) J Non-Cryst Solids , vol.212 , pp. 225
- Pereyra, I.¹ Alayo, M.I.²

19
- 0033743146
- (2000) Microelectron Reliability , vol.40 , pp. 621
- Silva, A.N.R.¹ Morimoto, N.I.² Bonnaud, O.³

20
- 0034273848
- (2000) J Vac Sci Technol A , vol.18 , pp. 2452
- Goullet, A.¹ Vallee, C.² Granier, A.³ Turban, G.⁴

21
- 0003735814
- Chichester: Wiley
- (1994) Infrared characteristic group frequencies
- Socrates, G.¹

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