In situ observation of behavior of organosilicon molecules in low-temperature plasma enhanced CVD

Thin Solid Films

Volumn 345, Issue 1, 1999, Pages 90-93

  Inoue, Yasushi ^a   Sugimura, Hiroyuki ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOCIATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IONIZATION; MASS SPECTROMETRY; MOLECULES; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON OXIDE FILM; TETRAMETHYLSILANE;

THIN FILMS;

EID: 0033531819     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00109-1     Document Type: Article

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