Spectroscopic studies on preparation of silicon oxide films by PECVD using organosilicon compounds

Plasma Sources Science and Technology

Volumn 5, Issue 2, 1996, Pages 339-343

  Inoue, Y ^a   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; EMISSION SPECTROSCOPY; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; ORGANOMETALLICS; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

ORGANOSILICON COMPOUNDS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

PLASMA APPLICATIONS;

EID: 0030133964     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/5/2/033     Document Type: Article

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