Mass spectroscopy in plasma-enhanced chemical vapor deposition of silicon-oxide films using tetramethoxysilane

Thin Solid Films

Volumn 316, Issue 1-2, 1998, Pages 79-84

  Inoue, Y ^a   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Fragmentation pattern; Mass spectroscopy; Organosilicon compound; Plasma enhanced chemical vapor deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MASS SPECTROMETERS; PLASMA APPLICATIONS; SILICON COMPOUNDS; SPUTTER DEPOSITION;

FRAGMENTATION PATTERNS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); TETRAMETHOXYSILANES;

DIELECTRIC FILMS;

EID: 0032027592     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00393-9     Document Type: Article

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