Prediction of fabrication distortions in step and flash imprint lithography templates

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2891-2895

  Martin, C J ^a   Engelstad, R L ^a   Lovell, E G ^a   Resnick, D J ^b   Weisbrod, E J ^b  

^a University of Wisconsin Madison   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; OPTICAL DEVICES; PRINTING; TEMPERATURE;

PROJECTION OPTICS; STEP AND FLASH IMPRINT LITHOGRAPHY;

LITHOGRAPHY;

EID: 0036883176     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1521743     Document Type: Article

References (4)

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