Method on surface roughness modification to alleviate stiction of microstructures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1505-1510

  Lee, Cheng Chang ^a   Hsu, Wensyang ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; CRYSTAL MICROSTRUCTURE; PASSIVATION; PHOTORESISTS; POLYSILICON; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; SURFACE ROUGHNESS; SURFACE TREATMENT;

MICRODEVICES;

STICTION;

EID: 0141793053     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1592809     Document Type: Conference Paper

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