Characterization of anhydrous HF gas-phase etching with CH3OH for sacrificial oxide removal

Sensors and Actuators, A: Physical

Volumn 64, Issue 1, 1998, Pages 27-32

  Lee, Jong Hyun ^a   Jang, Won Ick ^a   Lee, Chang Seung ^a   Lee, Yong Il ^a   Choi, Chang Auk ^a   Baek, Jong Tae ^a   Yoo, Hyung Joun ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Anhydrous HF; Gas phase etching; Microchannels; Sacrificial oxide

Indexed keywords

HYDROGEN INORGANIC COMPOUNDS; INTERFACES (MATERIALS); OXIDES; SURFACE TENSION;

CAPILLARY FORCE; GAS PHASE ETCHING;

ETCHING;

EID: 0031703673     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)80054-X     Document Type: Article

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