A new process for releasing micromechanical structures in surface micromachining

Journal of Micromechanics and Microengineering

Volumn 6, Issue 1, 1996, Pages 36-38

  Benitez, M A ^a   Plaza, J A ^a   Sheng, S Q ^a   Esteve, J ^a  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ETCHING; MICROMACHINING; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES;

FREE STANDING MICROSTRUCTURE; SACRIFICIAL ETCHING PROCESSES;

MICROELECTROMECHANICAL DEVICES;

EID: 0030091406     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/6/1/005     Document Type: Article

References (6)

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3. Mulhern G T, Soane D S and Howe R T 1993 Proc. 7th Int. Conf. on Solid-Stale Sensors and Actuators (Transducers '93) (Yokohama, 1993) pp 296-9
4. Kobayashi D, Kim C J and Fujita H 1991 Proc. 6th Int. Conf. on Solid-State Sensors and Actuators (Transducers '91) (San Francisco, CA, 1991) pp 14-5
5. Lober T, Huang J, Schmidt M A and Senturia S D 1988 IEEE Solid State Sensor and Actuator Workshop 1988: Tech. Digest (Hilton Head Island, SC, 1988) p 92
6. Offenberg M, Eisner B and Lärmer F 1994 Electrochem. Soc. Fall Meeting (1994) Ext. Abstr. 671