New release process for polysilicon surface micromachining using sacrificial polysilicon anchor and photolithography after sacrificial etching

Journal of Micromechanics and Microengineering

Volumn 9, Issue 4, 1999, Pages 300-304

  Xiao, Zhixiong ^a,b   Hao, Yilong ^b   Li, Ting ^b   Zhang, Guobing ^b   Liu, Shimei ^b   Wu, Guoying ^b  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b PEKING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MICROMECHANICS; DEPOSITION; ETCHING; PHOTOLITHOGRAPHY; SILICON WAFERS;

POLYSILICON; SACRIFICIAL ETCHING;

MICROMACHINING;

EID: 0033317760     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/9/4/303     Document Type: Article

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