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Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 145-155

Characterization of optics and masks for the EUV lithography

(7) Paret, Valérie a Boher, Pierre a Geyl, Roland b Vidal, Bernard c Putero Vuaroqueaux, Magali c Quesnel, Etienne d Robic, Jean Yves d

a SOPRA (France)

b SAGEM REOSC (France)

c AIX MARSEILLE UNIVERSITY (France)

d CEA LETI (France)

Author keywords

EUV; Lithography; Masks; Optics; Reflectometry

Indexed keywords

ION BEAMS; MAGNETRON SPUTTERING; MASKS; MULTILAYERS; OPTICAL SYSTEMS; OPTIMIZATION; PHOTOLITHOGRAPHY; REFLECTOMETERS;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

MICROELECTRONICS;

EID: 0036643632 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(02)00576-2 Document Type: Conference Paper

Times cited : (18)

References (14)

1
- 0017006268
- Reflective multilayer coatings for the far UV region
- (1976) Appl. Opt. , vol.15 , pp. 2333
- Spiller, E.¹

2
- 0004055759
- SPIE, Bellingham, WA
- (1994) Soft X-Ray Optics
- Spiller, E.¹

3
- 84975635029
- Molybdenum silicon multilayer mirrors for the extreme ultraviolet
- (1985) Appl. Opt. , vol.24 , pp. 883
- Barbee, T.W.¹ Mrowka, S.² Hettrick, M.C.³

4
- 0001210089
- Molybdenum silicon multilayer mirrors for normal incidence in the extreme ultraviolet
- (1996) Appl. Opt. , vol.34 , pp. 3727
- Skulina, K.M.¹ Alford, C.S.² Bionta, R.M.³ Makowiecki, D.M.⁴ Gullikson, E.M.⁵ Soufli, R.⁶ Kortright, J.B.⁷ Underwood, J.H.⁸

5
- 0032630541
- Multilayer coatings of 10× projection optics for extreme ultraviolet lithography
- (1999) Proc. SPIE , vol.3676 , pp. 710-716
- Montcalm, C.¹ Spiller, E.² Wedowski, M.³ Gullikson, E.M.⁴ Folta, J.A.⁵

6
- 0009404180
- EUV LLC, Livermore
- (1998) With Paper on EUV Lithography
- Gwyn, C.¹

7
- 0034768492
- (2001) Proc. SPIE , vol.4343 , pp. 363
- Gullikson, E.M.¹ Mrowska, S.² Kaufmann, B.³

8
- 0001195072
- (1989) J. Appl. Phys. , vol.65 , pp. 3453-3458
- Vidal, B.¹ Marfaing, J.C.²

9
- 0009406466
- Jakson Hall, USA
- (1992) Meeting on the Physics of X-Ray Multilayer Structures, Relationship between soft X-ray reflectance and structural parameters of nanometer period multiplayers
- Houdy, P.¹ Boher, P.²

10
- 85075852841
- Structural characterization and performances of rf-sputtered Mo/Si and Co/Si multilayers for soft X-ray optics
- (1991) Proc. SPIE , vol.1547 , pp. 21
- Boher, P.¹ Houdy, P.² Hennet, L.³ Kühne, M.⁴ Müller, P.⁵ Frontier, J.P.⁶ Trouslard, P.⁷ Senillou, C.⁸ Joud, J.C.⁹ Ruterana, P.¹⁰

11
- 0009455755
- Characterization of Mo/Si multilayers deposited by ion beam sputtering and rf magnetron sputtering
- (1992) Proc. SPIE , vol.614 , pp. 1742
- Murakami, K.¹ Nakamura, H.² Oshino, T.³ Ohtani, M.⁴ Nagata, H.⁵

12
- 0000101273
- (1991) Appl. Phys. Lett. , vol.59 , Issue.10 , pp. 1176-1178
- Lowell Morgan, W.¹

13
- 0000522975
- (1997) J. Vac. Sci. Technol. B , vol.15 , Issue.6 , pp. 2452
- Kearney, P.A.¹ Moore, C.E.² Tan, S.I.³ Vernon, S.P.⁴ Levesque, R.A.⁵

14
- 36549094548
- Grazing X-ray reflection analysis of nanometric scale structures
- (1990) J. Appl. Phys. , vol.68 , pp. 6133
- Boher, P.¹ Houdy, P.² Schiller, C.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.