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Journal of Electronic Materials

Volumn 30, Issue 4, 2001, Pages 355-359

Material and electrical properties of electroless Ag-W thin film

(5) Inberg, A a Shacham Diamand, Y a Rabinovich, E b Golan, G b Croitoru, N a

a TEL AVIV UNIVERSITY (Israel)

b HOLON INSTITUTE OF TECHNOLOGY (Israel)

Author keywords

Electrical resistivity; Electroless deposition; Microhardness; Reflectivity; Silver; Tungsten

Indexed keywords

CRYSTAL ORIENTATION; ELECTROLESS PLATING; ELECTRONICS PACKAGING; MICROELECTRONICS; MICROHARDNESS; OPTICAL MICROSCOPY; SEMICONDUCTING SILICON; SILVER; SUBSTRATES; THERMAL EFFECTS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; ULSI CIRCUITS; X RAY PHOTOELECTRON SPECTROSCOPY;

X-RAY FLUORESCENT (XRF) SPECTROSCOPY;

THIN FILMS;

EID: 0035306610 PISSN: 03615235 EISSN: None Source Type: Journal
DOI: 10.1007/s11664-001-0043-x Document Type: Article

Times cited : (14)

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12
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- to be published
- A. Inberg, Y. Shacham-Diamand, E. Rabinovich, G. Golan, and N. Croitoru, Thin Solid Films (to be published).
- Thin Solid Films
- Inberg, A.¹ Shacham-Diamand, Y.² Rabinovich, E.³ Golan, G.⁴ Croitoru, N.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.