Characterizations of super hard Cu films containing insoluble W prepared by sputter deposition

Materials Chemistry and Physics

Volumn 72, Issue 2, 2001, Pages 286-289

  Chu, J P ^a   Liu, C J ^a   Lin, C H ^a   Lin, T N ^a   Wang, S F ^b  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^b NATIONAL TAIPEI UNIVERSITY OF TECHNOLOGY   (Taiwan)

Author keywords

Sputtering; Thin films; Wear

Indexed keywords

COPPER; CRYSTAL MICROSTRUCTURE; GRAIN GROWTH; MAGNETRON SPUTTERING; SOLID SOLUTIONS; SPUTTER DEPOSITION; THIN FILMS; TUNGSTEN; WEAR RESISTANCE;

CRYSTALLITES;

METALLIC FILMS;

EID: 0035500565     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(01)00454-0     Document Type: Article

References (9)