Carbon nitride thin films formed by low energy ion beam deposition with positive and negative ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 73-78

  Enders, B ^a   Horino, Y ^a   Tsubouchi, N ^a   Chayahara, A ^a   Kinomura, A ^a   Fujii, K ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CARBON INORGANIC COMPOUNDS; CYANIDES; DEPOSITION; ION BEAMS; IONS; NITROGEN; SILICON WAFERS; SUBSTRATES; THIN FILMS;

ION BEAM DEPOSITION;

NITRIDES;

EID: 0031546183     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00642-8     Document Type: Article

References (116)

1. A.Y. Liu and M.L. Cohen, Science 245 (1989) 841.
2. M.L. Cohen, Phys. Rev. B 32 (1985) 7988.
3. A.Y. Liu and M.L. Cohen, Phys. Rev. B 41 (1990) 10727.
4. J.L. Corkill and M.L. Cohen, Phys. Rev. B 48 (1993) 17622.
5. A.Y. Liu and R.M. Wentzcovitch, Phys. Rev. B 50 (1994) 10362.
6. H. Yao and W.Y. Ching, Phys. Rev. B 50 (1994) 11231.
7. J. Ortega and O.F. Sankey, Phys. Rev. B 51 (1995) 2624.
8. Y. Guo and W.A. Goddard III, Chem. Phys. Lett. 237 (1995) 72.
9. D.M. Teter and R.J. Hemley, Science 271 (1996) 53.
10. C. Niu, Y.Z. Lu and C.M. Lieber, Science 261 (1993) 334.
11. K.M. Yu, M.L. Cohen, E.E. Haller, W.L. Hansen, A.Y. Liu and I.C. Wu, Phys. Rev. B 49 (1994) 5034.
12. J.P. Riviere, J. Texier, J. Delafond, M. Jaouert, E.L. Mathe and J. Chaumont, Mater. Lett. 22 (1995) 115
13. Y. Horino, N. Tsubouchi, K. Fujii, T. Nakata and T. Takagi, Nucl. Instr. Meth. Phys. Res. B 106 (1995) 657.
14. K. Fujii, Y. Horino, N. Tsubouchi, B. Enders, A. Chayahara and A. Kinomura, Surf. Coat. Technol. (1996), in press.
15. D.I. Jones and A.D. Steward, Philos. Mag. B 46 (1982) 423.
16. O. Amir and R. Kalish, J. Appl. Phys. 70 (1991) 4958.
17. C.A. Davis, D.R. McKenzie, Y. Yin, E. Kravtchinskaia, G.A.J. Amaratunga and V.S. Veerasamy, Philos. Mag. B 69 (1994) 1133.
18. C.A. Davis, Y. Yin, D.R. McKenzie, L.E. Hall, E. Kravtchinskaia, V. Keast, G.A.J. Amaratunga and V.S. Veerasamy, J. Non-Crystalline Solids 170 (1994) 46.
19. O. Matsumoto, T. Kotaki, H. Shikano, K. Takemura and S. Tanaka, J. Electrochem. Soc. 141 (1994) L16.
20. F.-R. Weber and H. Oechsner, Surf. Coat. Technol. 74/75 (1995) 704.
21. H.-X. Han and B.J. Feldman, Solid State Commun. 65 (1988) 921.
22. J. Mort, M.A. Machonkin and K. Okumura, Appl. Phys. Lett. 59 (1991) 3148.
23. S. Nowak, P. Gröning, O.M. Küttel, M. Collaud and G. Dietler, J. Vac. Sci. Technol. A 10 (1992) 3419.
24. M. Ricci, M. Trinquecoste, F. Auguste, R. Canet, P. Delhaes, C. Guimon, G. Pfister-Guillouzo, B. Nysten and J.P. Issi, J. Mater. Res. 8 (1993) 480.
25. A. Bousetta, M. Lu, A. Bensaoula and A. Schultz, Appl. Phys. Lett. 65 (1994) 696.
26. A. Bousetta, M. Lu and A. Bensaola, J. Vac. Sci. Technol. A 13 (1995) 1639.
27. F. Demichelis, X.F. Rong, S. Schreiter, A. Tagliaferro and C. De Martino, Diam. Relat. Mater. 4 (1995) 361.
28. S.F. Durrant, E.C. Rangel and M.A. Bica de Moraes, J. Vac. Sci. Technol. A 13 (1995) 1901.
29. S. Vepřek, J. Weidmann and F. Glatz, J. Vac. Sci. Technol. A 13 (1995) 2914.
30. T.-Y. Yen and C.-P. Chou, Appl. Phys. Lett. 67 (1995) 2801.
31. K.J. Clay, S.P. Speakman, G.A.J. Amaratunga and S.R.P. Silva, J. Appl. Phys. 79 (1996) 7227.
32. D. Marton, K.J. Boyd, A.H. Al-Bayati, S.S. Todorov and J.W. Rabalais, Phys. Rev. Lett. 73 (1994) 118.
33. S. Miyake, S. Watanabe, H. Miyazawa, M. Murakawa, R. Kaneko and T. Miyamoto, Appl. Phys. Lett. 65 (1994) 3206.
34. J. Viehland, S. Lin, B.J. Feldman, K. Kilgore and M.T. Jones, Solid State Commun. 80 (1991) 597.
35. D.F. Franceschini, C.A. Achete and F.L. Freire Jr., Appl. Phys. Lett. 60 (1992) 3229.
36. F.L. Freire Jr., C.A. Achete, D.F. Franceschini, C. Gatts and G. Mariotto, Nucl. Instr. Meth. Phys. Res. B 80/81 (1993) 1464.
37. E.H.A. Dekempeneer, J. Meneve, J. Smeets, S. Kuypers, L. Eersels and R. Jacobs, Surf. Coat. Technol. 68/69 (1994) 621.
38. M. Diani, A. Mansour, L. Kubler, J.L. Bischoff and D. Bolmont, Diam. Relat. Mater. 3 (1994) 264.
39. F.L. Freire Jr., C.A. Achete, G. Mariotto and R. Canteri, J. Vac. Sci. Technol. A 12 (1994) 3048.
40. F.L. Freire Jr., D.F. Franceschini and C.A. Achete, Nucl. Instr. Meth. Phys. Res. B 85 (1994) 268.
41. G. Mariotto, F.L. Freire Jr. and C.A. Achete, Thin Solid Films 241 (1994) 255.
42. F.L. Freire Jr., G. Mariotto, R.S. Brusa, A. Zecca and C.A. Achete, Diam. Relat. Mater. 4 (1995) 499.
43. F.L. Freire Jr., G. Mariotto, C.A. Achete and D.F. Franceschini, Surf. Coat. Technol. 74/75 (1995) 382.
44. J.J. Cuomo, P.A. Leary, D. Yu, W. Reuter and M. Frisch, J. Vac. Sci. Technol. 16 (1979) 299.
45. J.H. Kaufman, S. Metin and D.D. Saperstein, Phys. Rev. B 39 (1989) 13053.
46. C.J. Torng, J.M. Sivertsen, J.H. Judy and C. Chang, J. Mater. Res. 5 (1990) 2490.
47. T.-A. Yeh, C.-L. Lin, J.M. Sivertsen and J.H. Judy, IEEE Trans. Magn. 27 (1991) 5163.
48. M.Y. Chen, X. Lin, V.P. Dravid, Y.W. Chung, M.S. Wong and W.D. Sproul, Surf. Coat. Technol. 54/55 (1992) 360.
49. E.E. Haller, M.L. Cohen and W.L. Hansen, Chem. Abstr. 117 (1992) 136 369.
50. M.Y. Chen, D. Li, X. Lin, V.P. Dravid, Y.-W. Chung, M.-S. Wong and W.D. Sproul, J. Vac. Sci. Technol. A 11 (1993) 521.
51. M.Y. Chen, X. Lin, V.P. Dravid, Y.W. Chung, M.S. Wong and W.D. Sproul, Tribol. Transact. 36 (1993) 491.
52. S. Kumar and T.L. Tansley, Solid State Commun. 88 (1993) 803.
53. D. Li, Y.-W. Chung, M.-S. Wong and W.D. Sproul, J. Appl. Phys. 74 (1993) 219.
54. N. Nakayama, Y. Tsuchiya, S. Tamada, K. Kosuge, S. Nagata, K. Takahiro and S. Yamaguchi, Jpn. J. Appl. Phys. 32 (1993) L1465.
55. S. Kumar and T.L. Tansley, J. Appl. Phys. 76 (1994) 4390.
56. D. Li, Y.-W. Chung, S. Yang, M.-S. Wong, F. Adibi and W.D. Sproul, J. Vac. Sci. Technol. A 12 (1994) 1470.
57. D. Li, X. Lin, V.P. Dravid, Y.-W. Chung, M.Y. Chen, M.-S. Wong and W.D. Sproul, Diam. Films Technol. (Tokyo) 4 (1994) 99.
58. D. Li, E. Cutiongco, Y.-W. Chung, M.-S. Wong and W.D. Sproul, Surf. Coat. Technol. 68/69 (1994) 611.
59. H. Sjöström, I. Ivanov, M. Johansson, L. Hultman, J.-E. Sundgren, S.V. Hainsworth, T.F. Page and L.R. Wallenberg, Thin Solid Films 246 (1994) 103.
60. P.V. Kola, D.C. Cameron, B.J. Meenan, K.A. Pischow, C.A. Anderson, N.M.D. Brown and M.S.J. Hashami, Surf. Coat. Technol. 74/75 (1995) 696.
61. S. Kumar and T.L. Tansley, Thin Solid Films 256 (1995) 44.
62. S. Kumar, T.L. Tansley and L.S. Wielunski, J. Phys. D: Appl. Phys. 28 (1995) 2335.
63. D. Li, X. Chu, S.-C. Cheng, X.-W. Lin, V.P. Dravid, Y.-W. Chung, M.-S. Wong and W.D. Sproul, Appl. Phys. Lett. 67 (1995) 203.
64. D. Li, S. Lopez, Y.-W. Chung, M.-S. Wong and W.D. Sproul, J. Vac. Sci. Technol. A 13 (1995) 1063.
65. S. Lopez, M.-S. Wong and W.D. Sproul, J. Vac. Sci. Technol. A 13 (1995) 1644.
66. H. Sjöström, S. Stafström, M. Boman and J.-E. Sundgren, Phys. Rev. Lett. 75 (1995) 1336.
67. X. Wang, P.J. Martin and T.J. Kinder, Thin Solid Films 256 (1995) 148.
68. Z.-B. Zhang, Y.-A. Li, S.-S. Xie and G.-Z. Yang, J. Mater. Sci Lett. 14 (1995) 1742.
69. H. Sjöström, L. Hultman, J.-E. Sundgren, S.V. Hainsworth, T.F. Page and G.S.A.M. Theunissen, J. Vac. Sci. Technol. A 14 (1996) 56.
70. H. Sjöström, W. Lanford, B. Hjörvarson, K. Xing and J.-E. Sundgren, J. Mater. Res. 11 (1996) 981.
71. A.H. Bhuiyan and S.V. Bhoraskar, J. Mater. Sci. 24 (1989) 3091.
72. T. Sekine, H. Kanda, Y. Bando, M. Yokoyama and K. Hojou, J. Mater. Sci. Lett. 9 (1990) 1376.
73. S.F. Durrant, N. Marçal, S.G. Castro, R.C.G. Vinhas, M.A. Bica de Moraes and J.H. Nicola, Thin Solid Films 259 (1995) 139.
74. J. Kouvetakis, R.B. Kaner, M.L. Sattler and N. Bartlett, J. Chem. Soc. Chem. Commun. (1986) 1758.
75. J. Kouvetakis, A. Bandari, M. Todd, B. Wilkens and N. Cave, Chem. Mater. 6 (1994) 811.
76. M.G. Krishna, K.R. Gunasekhar and S. Mohan, J. Mater. Res. 10 (1995) 1083.
77. J.A. Taylor, G.M. Lancaster and J.W. Rabalais, J. Am. Chem. Soc. 100 (1979) 4441.
78. W.A. Metz and E.W. Thomas, J. Appl. Phys. 53 (1982) 3529.
79. M. Iwaki, K. Takahashi and A. Sekiguchi, J. Mater. Res. 5 (1990) 2562.
80. H. Watanabe, Nucl. Instr. Meth. Phys. Res. B 80/81 (1993) 1489.
81. I. Gouzman, R. Brener and A. Hoffman, Thin Solid Films 253 (1994) 90.
82. A. Hoffman, I. Gouzman and R. Brener, Appl. Phys. Lett. 64 (1994) 845.
83. A. Hoffman, H. Geller, I. Gouzman, C. Cytermann, R. Brener and M. Kenny, Surf. Coat. Technol. 68/69 (1994) 616.
84. A. Hoffman, R. Brener, I. Gouzman, C. Cytermann, H. Geller, L. Levin and M. Kenny, Diam. Relat. Mater. 4 (1995) 292.
85. H. Xin, W. Xu, X. Shi, H. Zhu, C. Lin and S. Zou, Appl. Phys. Lett. 66 (1995) 3290.
86. D. Barbara, S. Prawer, S.P. Withrow, J.M. Willimas, D.N. Jamieson, A. Saint and S.P. Dooley, in: Ion Beam Modification of Materials, eds. J.S. Williams, R.G. Elliman and M.C. Ridgway (Elsevier, Amsterdam, 1996) p. 995.
87. A. Hoffman, M.J. Kenny, L.S. Wielunski, C. Cytermann, R. Brener and R.A. Clissold, in: Ion Beam Modification of Materials, eds. J.S. Williams, R.G. Elliman and M.C. Ridgway (Elsevier, Amsterdam, 1996) p. 986.
88. I.F. Hussein, Y. Zhou, C. Chan, J.I. Kleiman, Y. Gudimenko and K.-N. Leung, in: Ion-solid interactions for materials modification and processing, eds. D.B. Poker, D. Ila, Y.-S. Cheng, L.R. Harriott and T.W. Sigmon, Mat. Res. Soc. Symp. Proc., vol. 396 (1996) 255-60.
89. H. Xin, C. Lin, W. Xu, L. Wang, S. Zou, X. Wu, X. Shi and H. Zhu, J. Appl. Phys. 79 (1996) 2364.
90. A. Mansour and D. Ugolini, Phys. Rev. B 47 (1993) 10201.
91. D. Marton, A.H. Al-Bayati, S.S. Todorov, K.J. Boyd and J.W. Rabalais, Nucl. Instr. Meth. Phys. Res. B 90 (1994) 277.
92. S.S. Todorov, D. Marton, K.J. Boyd, A.H. Al-Bayati and J.W. Rabalais, J. Vac. Sci. Technol. A 12 (1994) 3192.
93. K.J. Boyd, D. Marton, S.S. Todorov, A.H. Al-Bayati, J. Kulik, R.A. Zuhr and J.W. Rabalais, J. Vac. Sci. Technol. A 13 (1995) 2110.
94. C. Ronning and H.C. Hofsäss, Electrochem. Soc., Spring meeting, Reno, Nevada, May 21., ext. abstr. vol. 95.
95. X.-A. Zhao, C.W. Ong, Y.C. Tsang, Y.W. Wong, P.W. Chan and C.L. Coy, Appl. Phys. Lett. 66 (1995) 2652.
96. J.F.D. Chubaci, T. Sakai, T. Yamamoto, K. Ogata, A. Ebe and F. Fujimoto, Nucl. Instr. Meth. Phys. Res. B 80/81 (1993) 463.
97. F. Fujimoto and K. Ogata, Jpn. J. Appl. Phys. 32 (1993) L420.
98. K. Ogata, J.F.D. Chubaci and F. Fujimoto, J. Appl. Phys. 76 (1994) 3791.
99. F. Rossi, B. André, A. van Veen, P.E. Mijnarends, H. Schut, F. Labohm, M.P. Delplancke, H. Dunlop and E. Anger, Thin Solid Films 253 (1994) 85.
100. F. Rossi, B. André, A. van Veen, P.E. Mijnarends, H. Schut, F. Labohm, H. Dunlop, M.P. Delplancke and K. Hubbard, J. Mater. Res. 9 (1994) 2440.
101. H.W. Song, F.Z. Cui, X.M. He, W.Z. Li and H.D. Li, J. Phys.: Condens. Matter 6 (1994) 6125.
102. C.M. Lieber and Z.J. Zhang, Adv. Mater. 6 (1994) 497.
103. Z.-M. Ren, Y.-C. Du, Z.-F. Ying, Y. Qiu, X.-X. Xiong, J.-D. Wu and F.-M. Li, Appl. Phys. Lett. 65 (1994) 1361.
104. Z.-M. Ren, Y.-C. Du, Y. Qiu, J.-D. Wu, Z.-F. Ying, X.-X. Xiong and F.-M. Li, Phys. Rev. B 51 (1995) 5274.
105. M.R. Wixom, J. Am. Ceram. Soc. 73 (1990) 1973.
106. J. Liebig, Ann. Pharm. 10 (1834) 1.
107. Gay-Lussac, Annalen 53 (1816) 139
108. M.-H. Whangbo, R. Hoffmann and R.B. Woodward, Proc. R. Soc. Lond. A 366 (1979) 23.
109. J. Peška, M.J. Beneš and O. Wichterle, Coll. Czech. Chem. Commun. 31 (1966) 243.
110. J.H. Chen and M.M. Labes, J. Polym. Sci.: Polym. Chem. Ed. 23 (1985) 517.
111. T.R. Hogness and L.-S. Ts'ai, J. Am. Chem. Soc. 54 (1932) 123.
112. L.L. Bircumshaw, F.M. Tayler and D.H. Whiffen, J. Chem. Soc. (1954)931.
113. S. Vepřek, Z. Phys. Chem. 86 (1973) 95.
114. L. Maya, J. Polym. Sci. A 31 (1993) 2595.
115. D. Beeman, J. Silverman, R. Lynds and M.R. Anderson, Phys. Rev. B 30 (1984) 870.
116. R.O. Dillon, J.A. Woollam and V. Katkanant, Phys. Rev. B 29 (1984) 3482.