Comparison of ultrathin CoTiO3 and NiTiO3 high-k gate dielectrics

Journal of Applied Physics

Volumn 89, Issue 6, 2001, Pages 3447-3452

  Pan, Tung Ming ^a   Lei, Tan Fu ^a   Chao, Tien Sheng ^a,b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0039189606     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1347405     Document Type: Article

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