SCOPUS 정보 검색 플랫폼

Electrochemical and Solid-State Letters

Volumn 3, Issue 9, 2000, Pages 433-434

High quality ultrathin CoTiO3 high-k gate dielectrics

(5) Pan, Tung Ming a Lei, Tan Fu a Chao, Tien Sheng b Chang, Kuo Lih c Hsieh, Kuang Chien c

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL NANO DEVICE LABORATORIES (Taiwan)

c UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; COBALT; COBALT COMPOUNDS; DIELECTRIC FILMS; ELECTRIC PROPERTIES; ELECTROCHEMICAL ELECTRODES; OXIDATION; PERMITTIVITY; SPUTTERING; TITANIUM; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

COBALT TITANIUM OXIDE FILM; GATE DIELECTRICS;

ELECTROCHEMISTRY;

EID: 0034275558 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.1391170 Document Type: Article

Times cited : (14)

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