Thickness and optical constant distributions of PECVD a-SiCx: H thin films along electrode radial direction

Thin Solid Films

Volumn 437, Issue 1-2, 2003, Pages 257-265

  Akaoglu, B ^a   Atilgan, I ^a   Katircioglu, B ^a  

^a MIDDLE EAST TECHNICAL UNIVERSITY   (Turkey)

Author keywords

Amorphous materials; Optical properties; Plasma processing and deposition; Silicon carbide

Indexed keywords

ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT TRANSMISSION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SEMICONDUCTING FILMS; SILICON CARBIDE;

OPTICAL BAND GAPS;

AMORPHOUS FILMS;

EID: 0038373019     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00682-5     Document Type: Article

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