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Volumn 227-230, Issue PART 1, 1998, Pages 465-469

Wide band gap a-SiC:H films for optoelectronic applications

Author keywords

a SiC:H films; ECR CVD; RF CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; ELECTRON CYCLOTRON RESONANCE; ENERGY GAP; OPTOELECTRONIC DEVICES; SILICON CARBIDE;

EID: 0032068759     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(98)00090-8     Document Type: Article
Times cited : (17)

References (17)
  • 8
    • 0030407698 scopus 로고    scopus 로고
    • Materials Research Society Symp. Proc., Pittsburgh, PA
    • V. Chu, J.P. Conde, Amorphous Silicon Technology 1996, Vol. 420, Materials Research Society Symp. Proc., Pittsburgh, PA, 1996, p. 381.
    • (1996) Amorphous Silicon Technology 1996 , vol.420 , pp. 381
    • Chu, V.1    Conde, J.P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.