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Volumn 227-230, Issue PART 1, 1998, Pages 465-469
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Wide band gap a-SiC:H films for optoelectronic applications
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Author keywords
a SiC:H films; ECR CVD; RF CVD
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CRYSTAL DEFECTS;
ELECTRON CYCLOTRON RESONANCE;
ENERGY GAP;
OPTOELECTRONIC DEVICES;
SILICON CARBIDE;
RADIO FREQUENCY CHEMICAL VAPOR DEPOSITION (RFCVD);
AMORPHOUS FILMS;
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EID: 0032068759
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-3093(98)00090-8 Document Type: Article |
Times cited : (18)
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References (17)
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