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Volumn 39, Issue 10, 2000, Pages 1611-1616

Correlation between optical path modulations and transmittance spectra of a-Si:H thin films

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT INTERFERENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SUBSTRATES; THIN FILMS;

EID: 0006718452     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.001611     Document Type: Article
Times cited : (5)

References (25)
  • 1
    • 0000381039 scopus 로고    scopus 로고
    • Reflectivity study of hexagonal GaN films grown on GaAs: Surface roughness, interface layer, and refractive in dex
    • S. Shokhovets, R. Goldhahn, V. Cimalla, T. S. Cheng, and C. T. Foxon, “Reflectivity study of hexagonal GaN films grown on GaAs: surface roughness, interface layer, and refractive in dex, ” J. Appl. Phys. 84, 1561-1566 (1998).
    • (1998) J. Appl. Phys. , vol.84 , pp. 1561-1566
    • Shokhovets, S.1    Goldhahn, R.2    Cimalla, V.3    Cheng, T.S.4    Foxon, C.T.5
  • 2
    • 0032003727 scopus 로고    scopus 로고
    • Characterization of inhomogeneous dielectric films by spectroscopic ellipsometry
    • J. Rivory, “Characterization of inhomogeneous dielectric films by spectroscopic ellipsometry, ” Thin Solid Films 313-314, 333-340 (1998).
    • (1998) Thin Solid Films , vol.313-314 , pp. 333-340
    • Rivory, J.1
  • 3
    • 0001122230 scopus 로고    scopus 로고
    • Spectroscopic ellipsometry of slightly inhomogeneous nonabsorbing thin films with arbitrary refractive-index profiles: Theoretical study
    • A. V. Tikhonravov, M. K. Trubetskov, and A. V. Krasilnikova, “Spectroscopic ellipsometry of slightly inhomogeneous nonabsorbing thin films with arbitrary refractive-index profiles: theoretical study, ” Appl. Opt. 37, 5902-5911 (1998).
    • (1998) Appl. Opt. , vol.37 , pp. 5902-5911
    • Tikhonravov, A.V.1    Trubetskov, M.K.2    Krasilnikova, A.V.3
  • 4
    • 0032000416 scopus 로고    scopus 로고
    • Spectroscopic ellipsometric characterization of transparent thin film amorphous electronic materials: Integrated analysis
    • K. V. Popov, A. V. Tikhonravov, J. Campmany, E. Bertran, S. Bosch, and A. Canillas, “Spectroscopic ellipsometric characterization of transparent thin film amorphous electronic materials: integrated analysis, ” Thin Solid Films 313-314, 379-383 (1998).
    • (1998) Thin Solid Films , vol.313-314 , pp. 379-383
    • Popov, K.V.1    Tikhonravov, A.V.2    Campmany, J.3    Bertran, E.4    Bosch, S.5    Canillas, A.6
  • 5
    • 17144442484 scopus 로고    scopus 로고
    • Characterization of graded refractive index silicon oxynitride thin films by spectroscopic ellipsometry
    • S. Callard, A. Gagnaire, and J. Joseph, “Characterization of graded refractive index silicon oxynitride thin films by spectroscopic ellipsometry, ” Thin Solid Films 313-314, 384-388 (1998).
    • (1998) Thin Solid Films , vol.313-314 , pp. 384-388
    • Callard, S.1    Gagnaire, A.2    Joseph, J.3
  • 6
    • 0031238021 scopus 로고    scopus 로고
    • Problem of ambiguity in the determination of optical constants of thin absorbing films from spectroscopic reflectance and transmittance measurements
    • K. Lamprecht, W. Papousek, and G. Leising, “Problem of ambiguity in the determination of optical constants of thin absorbing films from spectroscopic reflectance and transmittance measurements, ” Appl. Opt. 36, 6364-6371 (1997).
    • (1997) Appl. Opt. , vol.36 , pp. 6364-6371
    • Lamprecht, K.1    Papousek, W.2    Leising, G.3
  • 7
    • 0017017243 scopus 로고
    • A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film
    • J. C. Manifacier, J. Gasiot, and J. P. Fillard, “A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin film, ” J. Phys. 9, 1002-1004 (1976).
    • (1976) J. Phys. , vol.9 , pp. 1002-1004
    • Manifacier, J.C.1    Gasiot, J.2    Fillard, J.P.3
  • 9
    • 0020940620 scopus 로고
    • Determination of the thickness and optical constants of amorphous silicon
    • R. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon, ” J. Phys. 16, 1214-1222 (1983).
    • (1983) J. Phys. , vol.16 , pp. 1214-1222
    • Swanepoel, R.1
  • 10
    • 0024303136 scopus 로고
    • Method for determining the optical constants of a thin film on a transparent substrate
    • D. A. Minkov, “Method for determining the optical constants of a thin film on a transparent substrate, ” J. Phys. D22, 199 -205 (1989).
    • (1989) J. Phys , vol.D22
    • Minkov, D.A.1
  • 11
    • 0000490079 scopus 로고    scopus 로고
    • Optical characterization of dielectric and semiconductor thin films by use of transmission data
    • J. I. Cisneros, “Optical characterization of dielectric and semiconductor thin films by use of transmission data, ” Appl. Opt. 37, 5262-5270 (1998).
    • (1998) Appl. Opt. , vol.37 , pp. 5262-5270
    • Cisneros, J.I.1
  • 12
    • 0000647402 scopus 로고    scopus 로고
    • Influence of small inhomogeneities on the spectral characteristics of single thin films
    • A. V. Tikhonravov, M. K. Trubetskov, B. T. Sullivan, and J. A. Dobrowolski, “Influence of small inhomogeneities on the spectral characteristics of single thin films, ” Appl. Opt. 36, 7188-7198 (1997).
    • (1997) Appl. Opt. , vol.36 , pp. 7188-7198
    • Tikhonravov, A.V.1    Trubetskov, M.K.2    Sullivan, B.T.3    Dobrowolski, J.A.4
  • 13
    • 0021515834 scopus 로고
    • Determination of surface roughness and optical constants of inhomogeneous amorphous silicon films
    • R. Swanepoel, “Determination of surface roughness and optical constants of inhomogeneous amorphous silicon films, ” J. Phys. E 17, 896-903 (1984).
    • (1984) J. Phys. E , vol.17 , pp. 896-903
    • Swanepoel, R.1
  • 14
    • 77957680748 scopus 로고
    • Light reflection from films of continuously varying refractive index
    • R. Jacobsson, “Light reflection from films of continuously varying refractive index, ” Prog. Opt. 2, 247-286 (1966).
    • (1966) Prog. Opt. , vol.2 , pp. 247-286
    • Jacobsson, R.1
  • 15
  • 17
    • 0033098778 scopus 로고    scopus 로고
    • Effect of hydrogen dilution on the optical properties of hydrogenated amorphous silicon prepared by plasma deposition
    • M. Yamaguchi and K. Morigaki, “Effect of hydrogen dilution on the optical properties of hydrogenated amorphous silicon prepared by plasma deposition, ” Philos. Mag. B 79, 387-405 (1999).
    • (1999) Philos. Mag. B , vol.79 , pp. 387-405
    • Yamaguchi, M.1    Morigaki, K.2
  • 18
    • 0000871728 scopus 로고
    • Optical constants of rf sputtered hydrogenated amorphous Si
    • E. C. Freeman and W. Paul, “Optical constants of rf sputtered hydrogenated amorphous Si, ” Phys. Rev. B 20, 716-728 (1979).
    • (1979) Phys. Rev. B , vol.20 , pp. 716-728
    • Freeman, E.C.1    Paul, W.2
  • 19
    • 0000865323 scopus 로고
    • Structural, optical, and electrical properties of amorphous silicon films
    • M. H. Brodsky, R. S. Title, K. Weiser, and F. D. Pettit, “Structural, optical, and electrical properties of amorphous silicon films, ” Phys. Rev. B 1, 2632-2640 (1970).
    • (1970) Phys. Rev. B , vol.1 , pp. 2632-2640
    • Brodsky, M.H.1    Title, R.S.2    Weiser, K.3    Pettit, F.D.4
  • 20
    • 0018204673 scopus 로고
    • The relationship between optical inhomogeneity and film structure
    • M. Harris, H. A. Macleod, and S. Ogura, “The relationship between optical inhomogeneity and film structure, ” Thin Solid Films 57, 173-178 (1979).
    • (1979) Thin Solid Films , vol.57 , pp. 173-178
    • Harris, M.1    Macleod, H.A.2    Ogura, S.3
  • 21
    • 0032068764 scopus 로고    scopus 로고
    • Temperature and growth-rate effects on the hydrogen incorporation in a-Si:H
    • W. M. M. Kessels, R. J. Severans, M. C. M. Van de Sanden, and D. C. Schram, “Temperature and growth-rate effects on the hydrogen incorporation in a-Si:H, ” J. Non-Cryst. Solids 227230, 133-137 (1998).
    • (1998) J. Non-Cryst. Solids , vol.227-230 , pp. 133-137
    • Kessels, W.M.M.1    Severans, R.J.2    Van De Sanden, M.C.M.3    Schram, D.C.4
  • 22
    • 0031097779 scopus 로고    scopus 로고
    • Wide optical gap a-SiO:H films prepared by rf glow discharge
    • D. Das, S. M. Iftiquar, and A. K. Barua, “Wide optical gap a-SiO:H films prepared by rf glow discharge, ” J. Non-Cryst. Solids 210, 148-154 (1997).
    • (1997) J. Non-Cryst. Solids , vol.210 , pp. 148-154
    • Das, D.1    Iftiquar, S.M.2    Barua, A.K.3
  • 23
    • 0000677078 scopus 로고    scopus 로고
    • Nitrogen-doping effects on electrical, optical and structural properties in hydrogenated amorphous silicon
    • A. Masuda, K. Itoh, K. Matsuda, Y. Yonezawa, M. Kumeda, and T. Shimizu, “Nitrogen-doping effects on electrical, optical and structural properties in hydrogenated amorphous silicon, ” J. Appl. Phys. 81, 6729-6737 (1997).
    • (1997) J. Appl. Phys. , vol.81 , pp. 6729-6737
    • Masuda, A.1    Itoh, K.2    Matsuda, K.3    Yonezawa, Y.4    Kumeda, M.5    Shimizu, T.6
  • 24
    • 0030244719 scopus 로고    scopus 로고
    • Investigation of the siliconplasma silicon nitride interface with in situ transient photoconductivity measurements
    • J. R. Elmiger and M. Kunst, “Investigation of the siliconplasma silicon nitride interface with in situ transient photoconductivity measurements, ” Appl. Surf. Sci. 103, 11-18 (1996).
    • (1996) Appl. Surf. Sci. , vol.103 , pp. 11-18
    • Elmiger, J.R.1    Kunst, M.2
  • 25
    • 0038331482 scopus 로고    scopus 로고
    • Improved hydrogen depth profiles with in-chamber annealing of hydrogenated amorphous silicon thin films
    • R. Ruther, J. Livingstone, N. Dytlowski, and D. Cohen, “Improved hydrogen depth profiles with in-chamber annealing of hydrogenated amorphous silicon thin films, ” J. Appl. Phys. 79, 175-178 (1996).
    • (1996) J. Appl. Phys. , vol.79 , pp. 175-178
    • Ruther, R.1    Livingstone, J.2    Dytlowski, N.3    Cohen, D.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.