Silicon carbide alloys produced by hot wire, hot wire plasma-assisted and plasma-enhanced CVD techniques

Applied Surface Science

Volumn 184, Issue 1-4, 2001, Pages 8-19

  Ferreira, I ^a   Costa, M E V ^b   Pereira, L ^a   Fortunato, E ^a   Martins, R ^a   Ramos, A R ^c   Silva, M F ^c  

^a Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

Author keywords

a SiC:H thin films; HW CVD; HWPA CVD; PE CVD

Indexed keywords

ETHYLENE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILANES; STRETCHING; THIN FILMS;

OPTICAL BAND GAP;

SILICON CARBIDE;

EID: 0035852240     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00663-8     Document Type: Article

References (31)