Overhang test structure deposition profiles of pulsed plasma fluorocarbon films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane

Chemical Vapor Deposition

Volumn 6, Issue 1, 2000, Pages 27-32

  Labelle, Catherine B ^a   Gleason, Karen K ^a  

^a Massachusetts Institute of Technology   (United States)

Author keywords

Deposition profiles; Fluorocarbon films; Overhang test structure; PECVD; Pulsed plasmas

Indexed keywords

EID: 0038062456     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-3862(200002)6:1<27::AID-CVDE27>3.0.CO;2-D     Document Type: Article

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