Profile simulation of conformality of chemical vapor deposited coooer in subquarter-micron trench and via structures

Journal of Applied Physics

Volumn 82, Issue 9, 1997, Pages 4651-4660

  Burke, Aaron ^a,d   Braeckelmann, Gregory ^a   Manger, Dirk ^a   Eisenbraun, Eric ^a   Kaloyeros, Alain E ^a   McVittie, Jim P ^b   Han, Joseph ^b   Bang, David ^b   Loan, James F ^c   Sullivan, John J ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b Stanford University   (United States)

^c MKS Instruments   (United States)

^d Tokyo Electron Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001628983     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366204     Document Type: Article

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