Changes in material properties of low-k interlayer dielectric polymers induced by exposure to plasmas

Microelectronic Engineering

Volumn 65, Issue 4, 2003, Pages 463-477

  Trabzon, L ^a   Awadelkarim, O O ^b  

^a ISTANBUL TECHNICAL UNIVERSITY   (Turkey)

^b The Pennsylvania State University   (United States)

Author keywords

Divinylsiloxane benzcyclobutane; Fluorinated poly arylene ether; Material properties; Plasma polymer interaction

Indexed keywords

ANISOTROPY; CROSSLINKING; ION BOMBARDMENT; LEAKAGE CURRENTS; PERMITTIVITY; PLASMAS; POLYMERS; ULTRAVIOLET RADIATION;

PLASMA CHARGING;

DIELECTRIC MATERIALS;

EID: 0037623280     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00165-5     Document Type: Article

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