The effect of Ar+ ion bombardment on SiO2 aerogel film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6955-6958

  Kim, Hong Ryul ^a   Park, Hyung Ho ^a  

^a Yonsei University   (South Korea)

Author keywords

Ar+ ion bombardment; Intermetal dielectric; Low dielectric; SiO2 aerogel

Indexed keywords

EID: 0001096192     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6955     Document Type: Article

References (8)

1. S. P. Jeng, R. H. Havemann and M. C. Chang: Proc. Mater. Res. Soc. Symp. 25 (1994) 337.
2. M. H. Jo, H. H. Park, D. J. Kim, S. H. Hyun, S. Y. Choi and J. T. Paik: J. Appl. Phys. 82 (1997) 1299.
3. H. R. Kim, H. H. Park, S. H. Hyun and G. Y. Yeom: to be published in Thin Solid Films.
4. C. J. Brinker, K. D. Keeper, D. W. Schaefer and C. S. Ashley: J. Non-Cryst. Solids 48 (1982) 47.
5. D. J. Kim and S. H. Hyun: J. Korean Ceram. Soc. 33 (1996) 485.
6. T. Homma and Y. Murao: Proc. ISMIC Conf. 101 (1992) 65.
7. C. J. Brinker and G. W. Scherer: Sol-Gel Science (Academic Press, San Diego, 1990) p. 581
8. H. H. Park, K. H. Kwon, J. L. Lee, K. S. Suh, O. J. Kwon and K. I. Cho: J. Appl. Phys. 76 (1994) 4596.