Correlation of antenna charging and gate oxide reliability

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 990-994

  Gabriel, Calvin T ^a   Nariani, Subhash R ^a  

^a PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5844386170     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580068     Document Type: Article

References (12)

1. M. R. Lin et al., IEEE Electron. Device Lett. 15, 475 (1994).
2. J. J. Hackenburg, M. J. Dion, D. F. Hemmenway, L. G. Pearce, and J. W. Werner, J. Vac. Sci. Technol. A 13, 370 (1995).
3. K. Machida, M. Itsumi, K. Minegishi, and E. Arai, J. Vac. Sci. Technol. B 13, 889 (1995).
4. K. Markus, C. M. Osburn, P. Magill, and S. M. Bobbio, J. Vac. Sci. Technol. A 12, 1339 (1994).
5. C. Gabriel, Proc. SPIE 2091, 239 (1993).
6. R. Rakkhit et al., Proc. IRPS 293 (1993).
7. A. K. Stamper, J. B. Lasky, and J. W. Adkisson, J. Vac. Sci. Technol. A 13, 905 (1995).
8. D. V. Podlesnik, Proc. Plasma Etch Users Group 2, 1 (1995).
9. S. R. Nariani and C. T. Gabriel, IEEE Electron. Device Lett. 16, 242 (1995).
10. S. R. Nariani, C. T. Gabriel, D. Pramanik, and K. Ng, Proc. IEEE Int. Conf. Microelectron. Test Struct. 8, 93 (1995).
11. C. T. Gabriel and J. P. McVittie, J. Vac. Sci. Technol. A 13, 900 (1995).
12. C. Gabriel and J. C. Mitchener, Proc. SPIE 1086, 598 (1989).