The evolution of materials for the photolithographic process

Journal of Photopolymer Science and Technology

Volumn 16, Issue 4, 2003, Pages 621-627

  Willson, C Grant ^a   Trinque, Brian C ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Chemically amplified resist; Dissolution inhibitor; EUV lithography; Fluoropolymer; Photolithography; Step and Flash Imprint Lithography

Indexed keywords

FLUORINE DERIVATIVE; POLYMER;

ARTICLE; DISSOLUTION; GLASS TRANSITION TEMPERATURE; INDUSTRY; INTERMETHOD COMPARISON; MATERIAL COATING; POLYMERIZATION; PREDICTION; PROCESS DESIGN; RADIOSENSITIVITY; SEMICONDUCTOR; TECHNOLOGY; TOPOGRAPHY;

EID: 0037493165     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.621     Document Type: Article

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