Structural, optical and electrical properties of ZnO and ZnO-Al2O3 films prepared by dc magnetron sputtering

Applied Physics A: Materials Science and Processing

Volumn 70, Issue 4, 2000, Pages 421-424

  Meng, X Q ^a,b   Zhen, W ^a   Guo, J P ^a   Fan, X J ^a  

^a WUHAN UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; ELECTRODES; ENERGY GAP; MAGNETRON SPUTTERING; MORPHOLOGY; OPTICAL PROPERTIES; SEMICONDUCTOR DIODES; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

BLUE EMITTER DIODE; DC MAGNETRON SPUTTERING; STRUCTURAL PROPERTIES;

ZINC COMPOUNDS;

EID: 0034171568     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051060     Document Type: Article

References (13)

1. T. Ohnishi, A. Ohotomo, M. Kawasaki et al.: Appl. Phys. Lett. 72, 824 (1998)
2. M.-S. Wu, W.-C. Shih, W.-H. Tsai: J. Phys. D: Appl. Phys. 31, 943 (1998)
3. M.N. Kamalasanan, S. Chandra: Thin Solid Films 288, 112 (1996)
4. S. Nakamura, M. Senoh, T. Mukai: Jpn J. Appl. Phys. 30, L1708 (1991)
5. H. Morkoc, S. Strite, G.B. Gao et al.: J. Appl. Phys. 76, 1364 (1994)
6. D.C. Reynolds, D.C. Look, B. Jogai: Solid State Commun. 99, 873 (1996)
7. T. Minami, T. Kakumu, Y. Takeda, S. Takata: Thin Solid Films 290, 1 (1996)
8. K. Tominaga, M. Kataoka, H. Manabe et al.: Thin Solid Films 290, 84 (1996)
9. D.H. Bao, H.S. Gu, A.X. Kuang: Thin Solid Films 312, 37 (1998)
10. M.N. Kamalasanan, N.O. Kumar, S. Chandra: J. Appl. Phys. 74, 679 (1993)
11. H.X. Han, B.G. Feldman: Solid State Commun. 65, 921 (1988)
12. S.-D. Mo, W.Y. Ching: Phys. Rev. B 57, 15219 (1998)
13. J.C. Boettger: Phys. Rev. B 55, 750 (1997)