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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 3, 2001, Pages 963-970

Structural, electrical, and optical properties of transparent conductive oxide ZnO:Al films prepared by dc magnetron reactive sputtering

(5) Chen, M a Pei, Z L b Wang, X a Sun, C b Wen, L S b

a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY (China)

b INSTITUTE OF METAL RESEARCH (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CARRIER CONCENTRATION; CARRIER MOBILITY; ELECTRIC CONDUCTANCE; MAGNETRON SPUTTERING; QUARTZ; RESIDUAL STRESSES; SEMICONDUCTOR DOPING; X RAY SPECTROSCOPY; ZINC OXIDE;

OPTICAL BANDGAP; VISIBLE TRANSMITTANCE;

CONDUCTIVE FILMS;

EID: 0035335158 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1368836 Document Type: Article

Times cited : (180)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.