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Volumn 398-399, Issue , 2001, Pages 53-58
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Transparent conducting impurity-co-doped ZnO:Al thin films prepared by magnetron sputtering
a
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Author keywords
Co doping; Etching rate; Magnetron sputtering; Thin films; Transparent conducting oxide; ZnO
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Indexed keywords
CHEMICAL RESISTANCE;
CRYSTAL IMPURITIES;
ELECTRIC CONDUCTIVITY;
ETCHING;
FILM PREPARATION;
MAGNETRON SPUTTERING;
RATE CONSTANTS;
SEMICONDUCTOR DOPING;
TRANSPARENCY;
ZINC COMPOUNDS;
TRANSPARENT CONDUCTING OXIDES;
THIN FILMS;
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EID: 0345324396
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(01)01303-7 Document Type: Conference Paper |
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Times cited : (149)
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References (20)
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