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Volumn 20, Issue 1, 2002, Pages 33-36
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Reduction of residual gas in a sputtering system by auxiliary sputter of rare-earth metal
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ARGON;
AUGER ELECTRON SPECTROSCOPY;
CHEMICAL ANALYSIS;
DEGRADATION;
MAGNETRON SPUTTERING;
NITRIFICATION;
OXIDATION;
PRESSURE;
TEMPERATURE;
TITANIUM;
VACUUM APPLICATIONS;
ZINC COMPOUNDS;
AUXILLARY SPUTTERING POWER CONSUMPTION;
BACKGROUND PRESSURE;
OIL DIFFUSION PUMP;
RESIDUAL GAS;
SPUTTERING TIME;
VACUUM CHAMBER;
DYSPROSIUM;
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EID: 0036165622
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1421597 Document Type: Article |
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Times cited : (6)
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References (4)
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