Field emission from amorphous diamond coated Mo tip emitters by pulsed laser deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 840-844

  Ding, M Q ^a,c   Myers, A F ^a   Choi, W B ^a   Vispute, R D ^a   Camphausen, S M ^a   Narayan, J ^a   Cuomo, J J ^a   Hren, J J ^a   Bruley, J ^b  

^a North Carolina State University   (United States)

^b Lehigh University   (United States)

^c BEIJING VACUUM ELECTRONICS RESEARCH INSTITUTE   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRON DIFFRACTION; ELECTRON EMISSION; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; MOLYBDENUM; NANOSTRUCTURED MATERIALS; PULSED LASER APPLICATIONS; TRANSMISSION ELECTRON MICROSCOPY;

FIELD EMITTERS; SAPPHIRE SUBSTRATES;

DIAMOND FILMS;

EID: 0031189634     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589495     Document Type: Article

References (30)

1. C. Wang, A. Garcia, D. C. Ingramand, and M. E. Kordesh, Electron Lett. 27, 1459 (1991).
2. N. S. Xu, Y. Tzeng, and R. V. Latham, J. Phys. D 28, 1776 (1993).
3. J. Liu, V. V. Zhirnov, G. J. Wojak, A. F. Myers, W. B. Choi, J. J. Hren, S. D. Wolter, M. T. McClure, B. R. Stones, and J. T. Glass, Appl. Phys. Lett. 65, 2842 (1994).
4. E. I. Givargizov, V. V. Zhirnov, A. N. Stepanova, E. V. Rakova, A. N. Kiseley, and P. S. Plekhanov, Appl. Surf. Sci. 87/88, 24 (1995).
5. M. W. Geis, N. N. Efremow, J. D. Woodhouse, M. D. Mcaleese, M. Marchywka, D. G. Socker, and J. F. Hochedez, IEEE Lett. 12, 456 (1991).
6. K. OKano, K. Hoshina, M. Lida, S. Koizumi, and T. Inuzuka, Appl. Phys. Lett. 64, 2742 (1994).
7. W. B. Choi, J. J. Cuomo, V. V. Zhirnov, A. F. Myers, and J. J. Hren, Appl. Phys. Lett. 68, 1 (1996).
8. W. B. Choi, J. Liu, M. T. McClure, A. F. Myers, V. V. Zhirnov, J. J. Cuomo, and J. J. Hren, J. Vac. Sci. Technol. B 14, 2050 (1996).
9. F. J. Himpsel, J. A. Knapp, J. A. Van Vechten, and D. E. Eastman, Phys. Rev. B 20, 624 (1979).
10. J. Van der Weide, Z. Zhang, P. K. Baumann, M. G. Wensell, J. Bemhole, and R. J. Nemanich, Phys. Rev. B 50, 5903 (1994).
11. D. R. McKenzie, D. Muller, B. A. Pailthorpe, Z. H. Wang, E. Kravtchinskaia, D. Segal, P. B. Lukins, P. D. Swift, P. J. Martin, G. Amaratunga, P. H. Gaskell, and A. Saeed, Diam. Relat. Mater. 1, 51 (1991).
12. C. B. Collins, F. Davanloo, E. M. Juengerman, W. R. Osborn, and D. R. Jander, Appl. Phys. Lett. 54, 216 (1988).
13. T. A. Friedmann, M. P. Siegal, D. R. Tallant, R. L. Simpson, and F. Dominguez, in Novel Forms of Carbon II, edited by C. L. Renschler, D. Cox, J. Pouch, and Y. Achiba (Materials Research Society, San Francisco, 1994), Vol. 1, p. 349.
14. Y. Lifshitz, S. R. Kasi, and J. W. Rabalais, Phys. Rev. Lett. 62, 1290 (1989).
15. E. J. G. Spencer, P. H. Schmidt, D. C. Joy, and F. J. Sansalone, Appl. Phys. Lett. 29, 118 (1976).
16. J. J. Cuomo, D. L. Pappas, J. Bruley, J. P. Doyle, and K. L. Saenger, J. Appl. Phys. 70, 1706 (1991).
17. R. L. David, L. Pappas, R. A. Roy, J. J. Cuomo, and V. M. Sura, Appl. Phys. Lett. 61, 171 (1992).
18. T. A. Friedmann, K. F. McCarty, J. C. Barbour, M. P. Siegal, and D. C. Dibble, Appl. Phys. Lett. 68, 1643 (1996).
19. D. L. Pappas, K. L. Saenger, J. J. Cuomo, and R. W. Dreyfus, J. Appl. Phys. 72, 3966 (1992).
20. C. Xie, N. Kumar, and C. B. Collins, Proceedings of the 6th IVMC, 12-15 July, 1993, Newport, RI, p. 162.
21. G. A. J. Amaratunga and S. R. P. Silva, Appl. Phys. Lett. 68, 2529 (1996).
22. F. Y. Chuang, C. Y. Sun, H. F. Cheng, C. M. Huang, and I. N. Lin, Appl. Phys. Lett. 68, 1666 (1996).
23. ;A. F. Myers, S. M. Camphausen, J. J. Cuomo, and J. J. Hren, J. Vac. Sci. Technol. B 14, 2024 (1996).
24. J. Y. Shim, E. J. Chi, and H. K. Baik, Proceedings of the 9th IVMC, 7-12 July, 1996, St. Petersburg, Russia, p. 263.
25. J. M. Nieuwenhuizen and H. B. Haanstra, Philips Tech. Rev. 27, 87 (1966).
26. Milton Ohring, The Materials Science of Thin Films (Academic, New York, 1992).
27. J. J. Cuomo, D. L. Pappas, R. Lossy, J. P. Doyle, J. Bruley, G. W. Di Bello, and W. Krakow, J. Vac. Sci. Technol. A 10, 3414 (1992).
28. K. H. Bayliss and R. V. Latham, Proc. R. Soc. London, Ser. A 403, 285 (1986).
29. G. A. J. Amaratunga, J. Robertson, V. S. Veerasamy, W. I. Milne, and D. R. McKenzie, Diam. Relat. Mater. 4, 637 (1995).
30. Z. Feng, I. G. Brown, and J. W. Ager, J. Mater. Res. 10, 1585 (1995).