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Volumn 32, Issue 3, 2002, Pages 503-510

Application of selective area epitaxy for GaN devices

Author keywords

[No Author keywords available]

Indexed keywords

COALESCENCE; GALLIUM NITRIDE; LIQUID PHASE EPITAXY; METALLORGANIC VAPOR PHASE EPITAXY;

EID: 0036934777     PISSN: 00785466     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (34)
  • 15
    • 24544448954 scopus 로고    scopus 로고
    • [Eds.] S.J. Pearton, C. Kuo, A.F. Wright, T. Uenoyama, Materials Research Society, Warrendale, PA, USA
    • [15] TADATOMO K., OHUCHI Y., OKAGAWA H., ITOH H., MIYAKE H., HIRAMATSU K., [In] GaN and Related Alloys, [Eds.] S.J. Pearton, C. Kuo, A.F. Wright, T. Uenoyama, Materials Research Society, Warrendale, PA, USA 1999, p. G3.1.
    • (1999) GaN and Related Alloys
    • Tadatomo, K.1    Ohuchi, Y.2    Okagawa, H.3    Itoh, H.4    Miyake, H.5    Hiramatsu, K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.