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Volumn 73, Issue 3, 1998, Pages 333-335

Selective-area and lateral epitaxial overgrowth of III-N materials by metal organic chemical vapor deposition

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[No Author keywords available]

Indexed keywords


EID: 0001358565     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121825     Document Type: Review
Times cited : (81)

References (11)
  • 2
    • 21944438400 scopus 로고    scopus 로고
    • For recent work on SAE by MOCVD, see articles in "Section X: Selective Area Epitaxy," in the Proceedings of the Eighth International Conf. on Metalorganic Vapor Phase Epitaxy
    • For recent work on SAE by MOCVD, see articles in "Section X: Selective Area Epitaxy," in the Proceedings of the Eighth International Conf. on Metalorganic Vapor Phase Epitaxy, J. Cryst. Growth 170, (1997).
    • (1997) J. Cryst. Growth , vol.170
  • 3
    • 21944454937 scopus 로고    scopus 로고
    • See US Patent No. 04522661, for a discussion of the application of SALEO to the growth of high-purity semiconductors
    • See A. D. Morrison and T. Daud, US Patent No. 04522661, for a discussion of the application of SALEO to the growth of high-purity semiconductors.
    • Morrison, A.D.1    Daud, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.