Mechanics of relaxing SiGe islands on a viscous glass

Acta Mechanica Sinica/Lixue Xuebao

Volumn 18, Issue 5, 2002, Pages 441-456

  Huang, R ^a,c   Yin, H ^a   Liang, J ^a   Sturm, J C ^a   Hobart, K D ^b   Suo, Z ^a  

^a Princeton University   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

^c The University of Texas at Austin   (United States)

Author keywords

Elastic plate; Fracture; Semiconductor fabrication; Stress relaxation; Viscous flow

Indexed keywords

ANNEALING; FRACTURE; OPTOELECTRONIC DEVICES; RELAXATION PROCESSES; SEMICONDUCTING GLASS; STRESS RELAXATION; VISCOUS FLOW; X RAY DIFFRACTION;

BIAXIAL COMPRESSION; ELASTIC PLATE; SEMICONDUCTOR FABRICATION; SIGE ISLANDS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0036822707     PISSN: 05677718     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02486570     Document Type: Article

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