Relaxation of a strained elastic film on a viscous layer

Materials Research Society Symposium - Proceedings

Volumn 695, Issue , 2002, Pages 115-120

  Huang, R ^a   Yin, H ^a   Liang, J ^a   Hobart, K D ^b   Sturm, J C ^a   Suo, Z ^a  

^a Princeton University   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELASTICITY; EPITAXIAL GROWTH; GLASS; GLASS TRANSITION; OPTOELECTRONIC DEVICES; STRAIN; STRESS RELAXATION; THERMAL EXPANSION; VISCOSITY;

EPITAXIAL OPTOELECTRONIC DEVICES; GLASS FLOWS; SILICON GERMANIUM ALLOYS; STRAINED ELASTIC FILM; VISCOUS LAYER; WRINKLING;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0036350003     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

1. Group IV semiconducting materials