Effects of plasma treatment on the properties of Cu/Ta/fluorinated amorphous carbon (a-C:F)/Si multilayer structure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 5, 2002, Pages 1769-1773

  Yang, Sung Hoon ^a   Kim, Heondo ^a   Park, Jong Wan ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS SILICON; CARBON; CHEMICAL VAPOR DEPOSITION; COPPER; FLUORINE; INTERFACES (MATERIALS); NITROGEN; PLASMA INTERACTIONS;

PLASMA TREATMENT;

MULTILAYERS;

EID: 0036749622     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1502694     Document Type: Article

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