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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 10, 2001, Pages 5990-5993

Surface modification of low dielectric fluorinated amorphous carbon films by nitrogen plasma treatment

(3) Yang, S H a Kim, H a Park, J W a

a Hanyang University (South Korea)

Author keywords

ECRCVD; Fluorinated amorphous carbon; Plasma treatment; Surface energy; Surface modification

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; ELECTRON CYCLOTRON RESONANCE; FLUORINE; FLUOROCARBONS; HYDROCARBONS; NITROGEN; PERMITTIVITY; PLASMA APPLICATIONS; REFRACTIVE INDEX; SURFACE TREATMENT;

ELECTRON CYCLOTRON RESONANCE CHEMICAL VAPOR DEPOSITION; FLUORINATED AMORPHOUS CARBON; LOW DIELECTRIC FLUORINATED AMORPHOUS CARBON FILMS; NITROGEN PLASMA TREATMENT; POST PLASMA TREATMENT; SURFACE ENERGY;

AMORPHOUS FILMS;

EID: 0035484769 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.5990 Document Type: Article

Times cited : (3)

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