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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 2 A, 2001, Pages 694-697

Effect of post-plasma treatment time on the properties of low dielectric fluorinated amorphous carbon films

(2) Yang, S H a Park, J W a

a Hanyang University (South Korea)

Author keywords

ECRCVD; Fluorinated amorphous carbon; Plasma treatment; Surface energy; Wettability

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; FLUORINE; INTERFACIAL ENERGY; LEAKAGE CURRENTS; PERMITTIVITY; REFRACTIVE INDEX; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINATED AMORPHOROUS CARBON FILMS; POST PLASMA TREATMENT;

AMORPHOUS FILMS;

EID: 0035246438 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.694 Document Type: Article

Times cited : (8)

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