Effects of chemical interaction between Ta and SiOF on the crystallinity of Cu and Ta in Cu/Ta/SiOF films

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 38, Issue 12 A, 1999, Pages

  Lee, Kyoung Woo ^a   Lee, Seoghyeong ^a   Yang, Sung Hoon ^a   Kim, Young Il ^a   Park, Jong Wan ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL MICROSTRUCTURE; CRYSTAL STRUCTURE; DEGRADATION; DEHALOGENATION; INTERFACES (COMPUTER); METALLIC FILMS; OXIDES; SILICON COMPOUNDS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TEXTURES;

DEFLUORINATION; SILICON OXYFLUORIDE;

TANTALUM;

EID: 0033316998     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.l1457     Document Type: Article

References (11)