New approach in the monitoring and characterization of titanium nitride thin films

Journal of Materials Research

Volumn 14, Issue 2, 1999, Pages 436-441

  Logothetidis, S ^a   Meletis, E I ^b   Kourouklis, G ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^b Louisiana State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELLIPSOMETRY; MAGNETRON SPUTTERING; MONITORING; PHONONS; PLASMAS; RAMAN SPECTROSCOPY; SILICON WAFERS; STOICHIOMETRY; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

EX SITU SPECTROSCOPIC ELLIPSOMETRY; IN SITU SPECTROSCOPIC ELLIPSOMETRY; OPTICAL PHONON POSITION; PLASMA ENERGY;

THIN FILMS;

EID: 0033076368     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0062     Document Type: Article

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