Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering

Surface and Coatings Technology

Volumn 123, Issue 2-3, 2000, Pages 261-267

  Jastrabik, L ^a   Soukup, L ^a   Shaginyan, L R ^b   Onoprienko, A A ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

Author keywords

Carbon nitride; Composition; Deposition; Structure

Indexed keywords

FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROHARDNESS; MICROSTRUCTURE; NITRIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTER DEPOSITION; SUBSTRATES;

CARBON NITRIDE; MICROSTRUCTURE EVOLUTION;

PROTECTIVE COATINGS;

EID: 0033909250     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00478-8     Document Type: Article

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