Correlation between surface oxygen content and microstructure of carbon nitride films

Diamond and Related Materials

Volumn 11, Issue 3-6, 2002, Pages 1153-1156

  Szorenyi T ^a,b   Toth A L ^c   Bertoti I ^d   Antoni, F ^a   Fogarassy, E ^a  

^a Faculté de Médecine   (France)

^b RESEARCH GROUP ON LASER PHYSICS   (Hungary)

^c RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^d CHEMICAL RESEARCH CENTER   (Hungary)

Author keywords

Nitrides; Pulsed laser deposition; Scanning electron microscopy; X ray photoelectron spectroscopy

Indexed keywords

ABLATION; CARBON NITRIDE; DEPOSITION; EXCIMER LASERS; GRAPHITE; MICROSTRUCTURE; PRESSURE EFFECTS; SURFACE CHEMISTRY;

SURFACE OXYGEN CONTENT;

THIN FILMS;

CARBON NITRIDE;

EID: 0036508392     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00559-3     Document Type: Article

References (19)