Theoretical discussion on reduced aberration sensitivity of enhanced alternating phase-shifting masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 I, Issue , 2002, Pages 359-368

  Wong, Alfred K ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Aberrations; Alternating phase shifting mask; Enhanced alternating phase shifting mask; Optical lithography; Phase shifting mask

Indexed keywords

ABERRATIONS; DISTORTION (WAVES); ERROR ANALYSIS; MASKS; PHASE SHIFT; SPECTRUM ANALYSIS;

PHASE SHIFTING MASKS;

PHOTOLITHOGRAPHY;

EID: 0036413420     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474585     Document Type: Conference Paper

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