Proposal for pattern layout rule in application of alternating phase-shift mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3096, Issue , 1997, Pages 362-374

  Nakae, Akihiro ^a   Nakao, Shuji ^a   Matsui, Yasuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; INTEGRATED CIRCUIT LAYOUT; PHASE SHIFT;

CRITICAL DIMENSIONS; PHASE SHIFT MASKS;

MASKS;

EID: 0031363218     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.277281     Document Type: Conference Paper

References (6)