Extension of KrF lithography to sub-50 nm pattern formation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (I), Issue , 2000, Pages 358-365

  Nakao, Shuji ^a   Itoh, Jiroh ^a   Nakae, Akihiro ^a   Kanai, Itaru ^a   Saitoh, Takayiki ^a   Matsubara, Hiroshi ^a   Tsujita, Kouichrou ^a   Arimoto, Ichirou ^a   Wakamiya, Wataru ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PLASMA SOURCES;

PARTIAL PLASMA ASHING; PHASE SHIFT MASKS (PSM);

PHOTORESISTS;

EID: 0033683268     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389025     Document Type: Conference Paper

References (9)