Alternating phase shifted mask for logic gate levels, design and mask manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 27-37

  Liebmann, Lars ^a   Graur, Ioana ^a   Leipold, William ^a   Oberschmidt, James ^a   O'Grady, David ^a   Regaill, Denis ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; LOGIC GATES; MASKS; MICROPROCESSOR CHIPS;

PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0032665217     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354344     Document Type: Conference Paper

References (21)